Leigh Ann Kesler is a 3rd year PhD. Candidate at MIT in the Department of Nuclear Science and Engineering. She received her B.S. from the University of Illinois at Urbana/Champaign in 2012 in Nuclear, Plasma, and Radiological Engineering. Working at the Center for Plasma Interactions at the University of Illinois, she did research on several topics, including plasma processing for semiconductor manufacturing within optics cleaning, thin film deposition of transparent conductors, and θ-pinch plasmas for lithium divertor research. She also interned at both Los Alamos and Livermore National Laboratories, working on ICF modelling and imaging laser wakefield acceleration, respectively. At MIT, she has worked on several projects exploring plasma surface interactions with in-situ ion beam analysis. She works on both the DIONISOS system, studying the erosion of copper and aluminum films, and on DANTE, pursuing cross sectional data for the use of isotopic depth markers with ion beam analysis.

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